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Supply of deposition equipment for low-temperature metallic via filling

CEA Grenoble·Grenoble, France·Expired · Jul 31, 2026·Neg W Call·Supplies
Structured notice only
Oryginalny tytuł ogłoszenia

France – Microelectronic machinery and apparatus – Fourniture d’un équipement de dépôt dédié au remplissage métallique de vias à basse température

50/100

Ocena szansy

Needs reviewHigh complexity
SuppliesExpired
Skąd ta ocena?

Szansa

50 / 100

Złożoność

70 / 100

Czynniki ryzyka

Negotiated procedure with call for competition; likely limits number of candidates to a minimum of 3. No further negoti...

Full procurement documents (technical specifications, contract terms) not analyzed. Award criteria only partially known.

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Przegląd

Moderate opportunity

Kluczowe fakty

  • Supplies contract
  • 1 lot
  • Duration 12 MONTH
  • Supply of a deposition equipment for low-temperature metallic via filling for memory applications.
  • Equipment must handle 300mm wafers.
Pokaż pełne podsumowanie

This tender by CEA Grenoble seeks a deposition equipment for low-temperature metallic via filling for memory applications in its clean room. The equipment must handle 300mm wafers and deposit tungsten thin films with high conformity in high aspect ratio vias. The contract includes one mandatory option (maintenance level 1 training) and four optional options (heat exchangers, power transformer, advanced maintenance training, warranty extension). The procedure is a negotiated procedure with call for competition, EU-funded under FAMES Pilot Line. No estimated value is disclosed. Submission is electronic via www.marchespublics.gouv.fr by 31 July 2026, 14:00 CEST. Award criteria are price-based but not exclusively; full criteria are in procurement documents.

Ryzyka

Negotiated procedure with call for competition; likely limits number of candidates to a minimum of 3. No further negoti...

Full procurement documents (technical specifications, contract terms) not analyzed. Award criteria only partially known.

Analiza może być niepełna

Przeanalizowano tylko część dokumentacji. Pozostałe dokumenty mogą zawierać dodatkowe wymagania, certyfikaty lub dokumenty do złożenia.

Kluczowe wymagania

Technical

  • Equipment must be capable of low-temperature metallic via filling (tungsten) for memory applications.
  • Must support 300mm wafers.
  • High conformity deposition in vias with high aspect ratio.

Wymagania mogą być niepełne.

Kryteria udzielenia

Lot 1

Price is a criterion but not the only one; full award criteria are specified only in the procurement documents.

Zamawiający

Lokalizacja

Grenoble, FRA

Profil zamawiającego

Otwórz profil

Identyfikator

77568501900298

Działalność

Education

Części (1)

LOT-0001

Supply of deposition equipment for low-temperature metallic via filling

Acquisition of a dedicated deposition equipment for low-temperature metallic via filling for memory applications, capable of 300mm wafers, tungsten thin film deposition with high conformity in high aspect ratio vias. Includes mandatory and optional options as described.

SuppliesEU fundedElectronic submission

Lokalizacja

FRK24, France

Czas trwania

12 MONTH

Kategoria

Microelectronic machinery and apparatus

Kryteria udzielenia

Price

Termin

Expired Jul 31, 2026

Szczegóły zamówienia

Data publikacji
30 Jun 2026
Języki
French, English

Metadane referencyjne

Podstawa prawna
32014L0024

Identyfikatory referencyjne

ID przetargu
452081-2026

Dokumenty (1)

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