European Tender Electron Beam Lithography System
Titre original de l'avis
Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system
Score d'opportunité
Pourquoi ce score ?
Opportunité
75 / 100
Complexité
70 / 100
Facteurs de risque
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
Analyse approfondie du portefeuille
Utilise:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications
Aperçu
Moderate opportunityFaits clés
- EUR 3.5M estimated value
- Supplies contract
- 1 lot
- Supply of an Electron Beam Lithography system
- Installation and commissioning at the University of Twente
Afficher le résumé complet
Purchase of an Electron Beam Lithography system for the University of Twente's MESA+ Institute. Single lot, open procedure, EU funded. Estimated value €3.5M. Deadline 14 August 2026. Limited information on award criteria and eligibility requirements.
Risques
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
L'analyse peut être incomplète
Seule une partie des documents de consultation a été analysée. Des exigences, certificats ou documents de soumission supplémentaires peuvent exister dans les documents restants.
Exigences clés
Technical
- High resolution and high speed pattern definition in electron-sensitive resists
- Compatibility with substrate sizes up to 200mm diameter
- Suitable for a wide range of applications (photonics, nano-electronics, etc.)
Les exigences peuvent être incomplètes.
Acheteur
Localisation
Enschede, NLD
Site web
Profil acheteur
Identifiant
50130536
Activité
Education
Lots (1)
LOT-0000
European Tender Electron Beam Lithography System
Supply, installation, and support of a high-resolution, high-speed Electron Beam Lithography system compatible with substrates up to 200mm for academic and industrial research.
EUR 3.5M
Valeur estimée
Localisation
Catégorie
Date limite
Détails des critères
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Codes CPV supplémentaires
Note sur la valeur
Afficher les données TED originales
Titre original du lot
European Tender Electron Beam Lithography system
Description TED originale
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Détails de la procédure
- Date de publication
- 14 Jun 2026
- Langues
- English
Métadonnées de référence
- Base juridique
- 32014L0024
Identifiants de référence
- ID de l'appel d'offres
- 409508-2026
Documents (1)
Appels d'offres similaires
Score d'opportunité
Pourquoi ce score ?
Opportunité
75 / 100
Complexité
70 / 100
Facteurs de risque
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
Analyse approfondie du portefeuille
Utilise:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications