ALD-Anlage
Original notice title
Germany – Laboratory, optical and precision equipments (excl. glasses) – ALD-Anlage
Opportunity Score
Why this score?
Opportunity
60 / 100
Complexity
50 / 100
Risk factors
Maximum budget of €549,000 gross must not be exceeded. Bids exceeding this amount may be rejected.
Highly specific technical requirements for PE-ALD system with multilayer capability and substrate size range. May limit...
Deep Portfolio Analysis
Uses:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications
Tender facts
- Contracting authority
- Leibniz-Institut für Photonische Technologien e.V.
- Country
- Germany
- CPV
- 38000000 - Laboratory, optical and precision equipments (excl. glasses)
- Deadline
- Aug 04, 2026
- Estimated value
- EUR 461.3k
Overview
Strong opportunityKey Facts
- EUR 461.3k estimated value
- Supplies contract
- 1 lot
- Duration until Sep 2027
- Supply of a PE-ALD system for thin film deposition
- Substrate sizes from 5x5 mm to at least 150 mm wafers
Show full summary
Open tender by Leibniz-Institut für Photonische Technologien e.V. for a plasma-enhanced atomic layer deposition (PE-ALD) system for thin film deposition on substrates up to 150 mm wafers. Single lot, EU-funded, estimated value €461,344 (net), max budget €549,000 gross. Deadline: 2026-08-04. Award: 70% technical quality, 30% price. Requires at least 2 references and bank guarantee for advance payments. Language: German. Electronic submission via DTVP.
Risks
Maximum budget of €549,000 gross must not be exceeded. Bids exceeding this amount may be rejected.
Highly specific technical requirements for PE-ALD system with multilayer capability and substrate size range. May limit...
Analysis may be incomplete
Only part of the procurement documentation was analyzed. Additional eligibility requirements, certificates, or submission documents may exist in the remaining tender documentation.
Key Requirements
Technical
- Plasma-enhanced atomic layer deposition (PE-ALD) capability
- Substrate compatibility up to 150 mm wafers
- Multilayer deposition without vacuum interruption
Requirements may be incomplete.
Award Criteria
Lot 1
Buyer
Location
Jena, DEU
Identifier
DE151282932
Activity
Education
Lots (1)
LOT-0001
ALD-Anlage
Supply of a PE-ALD system for reproducible deposition of conductive, semiconducting, and dielectric thin films on substrates from 5x5 mm to at least 150 mm wafers, including multilayer processing without vacuum break, and a control PC with Windows 11.
EUR 461.3k
Estimated value
Location
Duration
Category
Award Criteria
Deadline
Award details
technische Spezifikationen
Value note
Show original TED data
Original TED description
Das Leibniz-Institut für Photonische Technologien e.V. schreibt für die Dünnschichtabscheidung eine Plasma-gestützte Atomlagenabscheidungsanlage (kurz: PE-ALD, engl. Plasma enhanced atomic layer deposition) aus, welche zum Abscheiden von Dünnschichten auf unterschiedlichen Substraten vom Einzelchipformat (5 x 5 mm²) bis mindestens 150 mm Wafer eingesetzt werden soll. Die zentralen Anforderungen an das System sind reproduzierbare Abscheideprozesse verschiedener leitfähiger, halbleitender und dielektrischer Schichten. Diese sollen auch ohne Vakuumunterbrechung (Multilagen) prozessiert werden. Ein Steuer-PC mit Monitor, Tastatur, Maus, entsprechender Software-Lizenzen und aktuellem Betriebssystem (Win 11) ist mitzuliefern.
Procurement Details
- Publication date
- 07 Jul 2026
- Languages
- German
Reference metadata
- Legal basis
- 32014L0024
Reference IDs
- Tender ID
- 469404-2026
Documents (2)
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Opportunity Score
Why this score?
Opportunity
60 / 100
Complexity
50 / 100
Risk factors
Maximum budget of €549,000 gross must not be exceeded. Bids exceeding this amount may be rejected.
Highly specific technical requirements for PE-ALD system with multilayer capability and substrate size range. May limit...
Deep Portfolio Analysis
Uses:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications