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ALD-Anlage

Leibniz-Institut für Photonische Technologien e.V.·Jena, Germany·EUR 461.3k·Expired · Aug 04, 2026·Open·Supplies
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Original notice title

Germany – Laboratory, optical and precision equipments (excl. glasses) – ALD-Anlage

60/100

Opportunity Score

PromisingMedium complexity
SuppliesExpired
Why this score?

Opportunity

60 / 100

Complexity

50 / 100

Risk factors

Maximum budget of €549,000 gross must not be exceeded. Bids exceeding this amount may be rejected.

Highly specific technical requirements for PE-ALD system with multilayer capability and substrate size range. May limit...

Deep Portfolio Analysis

Deep Company Fit Analysis

Uses:

  • Description
  • Industries & Services
  • Capabilities
  • Market & Experience
  • Certifications

Overview

Strong opportunity

Key Facts

  • EUR 461.3k estimated value
  • Supplies contract
  • 1 lot
  • Duration until Sep 2027
  • Supply of a PE-ALD system for thin film deposition
  • Substrate sizes from 5x5 mm to at least 150 mm wafers
Show full summary

Open tender by Leibniz-Institut für Photonische Technologien e.V. for a plasma-enhanced atomic layer deposition (PE-ALD) system for thin film deposition on substrates up to 150 mm wafers. Single lot, EU-funded, estimated value €461,344 (net), max budget €549,000 gross. Deadline: 2026-08-04. Award: 70% technical quality, 30% price. Requires at least 2 references and bank guarantee for advance payments. Language: German. Electronic submission via DTVP.

Risks

Maximum budget of €549,000 gross must not be exceeded. Bids exceeding this amount may be rejected.

Highly specific technical requirements for PE-ALD system with multilayer capability and substrate size range. May limit...

Analysis may be incomplete

Only part of the procurement documentation was analyzed. Additional eligibility requirements, certificates, or submission documents may exist in the remaining tender documentation.

Key Requirements

Technical

  • Plasma-enhanced atomic layer deposition (PE-ALD) capability
  • Substrate compatibility up to 150 mm wafers
  • Multilayer deposition without vacuum interruption

Requirements may be incomplete.

Award Criteria

Lot 1

Technical specifications (70%) — 70%Price (30%) — 30%

Buyer

Location

Jena, DEU

Identifier

DE151282932

Activity

Education

Lots (1)

LOT-0001

ALD-Anlage

Supply of a PE-ALD system for reproducible deposition of conductive, semiconducting, and dielectric thin films on substrates from 5x5 mm to at least 150 mm wafers, including multilayer processing without vacuum break, and a control PC with Windows 11.

SuppliesEU fundedElectronic submission

EUR 461.3k

Estimated value

Location

Jena, Germany

Duration

Aug 2026 - Sep 2027

Category

Laboratory, optical and precision equipments

Award Criteria

Price

Deadline

Expired Aug 04, 2026

Procurement Details

Publication date
07 Jul 2026
Languages
German

Reference metadata

Legal basis
32014L0024

Reference IDs

Tender ID
469404-2026

Documents (2)

Procurement document 1Submission portal 1

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