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European Tender Electron Beam Lithography System

Universiteit Twente·Enschede, Netherlands·EUR 3.5M·Expired · Aug 14, 2026·Open·Supplies
High valueStructured notice only
Original notice title

Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system

75/100

Opportunity Score

Needs reviewHigh complexity
SuppliesExpired
Why this score?

Opportunity

75 / 100

Complexity

70 / 100

Risk factors

Missing award criteria and eligibility requirements create uncertainty in bid preparation

System must meet stringent technical specifications (high resolution, speed, substrate compatibility)

Deep Portfolio Analysis

Deep Company Fit Analysis

Uses:

  • Description
  • Industries & Services
  • Capabilities
  • Market & Experience
  • Certifications

Overview

Moderate opportunity

Key Facts

  • EUR 3.5M estimated value
  • Supplies contract
  • 1 lot
  • Supply of an Electron Beam Lithography system
  • Installation and commissioning at the University of Twente
Show full summary

Purchase of an Electron Beam Lithography system for the University of Twente's MESA+ Institute. Single lot, open procedure, EU funded. Estimated value €3.5M. Deadline 14 August 2026. Limited information on award criteria and eligibility requirements.

Risks

Missing award criteria and eligibility requirements create uncertainty in bid preparation

System must meet stringent technical specifications (high resolution, speed, substrate compatibility)

Analysis may be incomplete

Only part of the procurement documentation was analyzed. Additional eligibility requirements, certificates, or submission documents may exist in the remaining tender documentation.

Key Requirements

Technical

  • High resolution and high speed pattern definition in electron-sensitive resists
  • Compatibility with substrate sizes up to 200mm diameter
  • Suitable for a wide range of applications (photonics, nano-electronics, etc.)

Requirements may be incomplete.

Buyer

Location

Enschede, NLD

Buyer profile

Open profile

Identifier

50130536

Activity

Education

Lots (1)

LOT-0000

European Tender Electron Beam Lithography System

Supply, installation, and support of a high-resolution, high-speed Electron Beam Lithography system compatible with substrates up to 200mm for academic and industrial research.

SuppliesEU fundedElectronic submission

EUR 3.5M

Estimated value

Location

Netherlands

Category

Laboratory, optical and precision equipments

Deadline

Expired Aug 14, 2026

Procurement Details

Publication date
14 Jun 2026
Languages
English

Reference metadata

Legal basis
32014L0024

Reference IDs

Tender ID
409508-2026

Documents (1)

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