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Electron beam lithography system

Universiteit Twente·Enschede, Netherlands·EUR 3.5M·Deadline Aug 21, 2026 · 42 days left·Open·Supplies
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Original notice title

Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system

0/100

Opportunity Score

High riskLow complexity
SuppliesOpen
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Opportunity

0 / 100

Complexity

0 / 100

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Buyer

Name

Universiteit Twente

Location

Enschede, NLD

Buyer profile

Open profile

Identifier

50130536

Activity

Education

Lots (1)

LOT-0000

European Tender Electron Beam Lithography system

The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.

SuppliesEU fundedElectronic submission

EUR 3.5M

Estimated value

Location

Netherlands

Category

Laboratory, optical and precision equipments

Procurement Details

Publication date
08 lip 2026
Notice type
Contract notice — standard
Languages
English

Reference metadata

Notice subtype
16
Notice version
1
Legal basis
32014L0024

Reference IDs

Tender ID
474919-2026

Documents (1)

Procurement document 1

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