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Supply of deposition equipment for low-temperature metallic via filling

CEA Grenoble·Grenoble, France·Expired · Jul 31, 2026·Neg W Call·Supplies
Structured notice only
Originaltitel der Bekanntmachung

France – Microelectronic machinery and apparatus – Fourniture d’un équipement de dépôt dédié au remplissage métallique de vias à basse température

50/100

Opportunity Score

Needs reviewHigh complexity
SuppliesExpired
Warum diese Bewertung?

Chance

50 / 100

Komplexität

70 / 100

Risikofaktoren

Negotiated procedure with call for competition; likely limits number of candidates to a minimum of 3. No further negoti...

Full procurement documents (technical specifications, contract terms) not analyzed. Award criteria only partially known.

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Eckdaten der Ausschreibung

Öffentlicher Auftraggeber
CEA Grenoble
Land
Frankreich
CPV
31712100 - Microelectronic machinery and apparatus
Frist
Jul 31, 2026

Überblick

Moderate opportunity

Wichtige Fakten

  • Supplies contract
  • 1 lot
  • Duration 12 MONTH
  • Supply of a deposition equipment for low-temperature metallic via filling for memory applications.
  • Equipment must handle 300mm wafers.
Vollständige Zusammenfassung anzeigen

This tender by CEA Grenoble seeks a deposition equipment for low-temperature metallic via filling for memory applications in its clean room. The equipment must handle 300mm wafers and deposit tungsten thin films with high conformity in high aspect ratio vias. The contract includes one mandatory option (maintenance level 1 training) and four optional options (heat exchangers, power transformer, advanced maintenance training, warranty extension). The procedure is a negotiated procedure with call for competition, EU-funded under FAMES Pilot Line. No estimated value is disclosed. Submission is electronic via www.marchespublics.gouv.fr by 31 July 2026, 14:00 CEST. Award criteria are price-based but not exclusively; full criteria are in procurement documents.

Risiken

Negotiated procedure with call for competition; likely limits number of candidates to a minimum of 3. No further negoti...

Full procurement documents (technical specifications, contract terms) not analyzed. Award criteria only partially known.

Analyse kann unvollständig sein

Nur ein Teil der Vergabeunterlagen wurde analysiert. Weitere Anforderungen, Zertifikate oder Einreichungsdokumente können in den übrigen Unterlagen enthalten sein.

Wichtige Anforderungen

Technical

  • Equipment must be capable of low-temperature metallic via filling (tungsten) for memory applications.
  • Must support 300mm wafers.
  • High conformity deposition in vias with high aspect ratio.

Anforderungen können unvollständig sein.

Zuschlagskriterien

Lot 1

Price is a criterion but not the only one; full award criteria are specified only in the procurement documents.

Auftraggeber

Ort

Grenoble, FRA

Website

www.cea.fr

Auftraggeberprofil

Profil öffnen

Kennung

77568501900298

Tätigkeit

Education

Lose (1)

LOT-0001

Supply of deposition equipment for low-temperature metallic via filling

Acquisition of a dedicated deposition equipment for low-temperature metallic via filling for memory applications, capable of 300mm wafers, tungsten thin film deposition with high conformity in high aspect ratio vias. Includes mandatory and optional options as described.

SuppliesEU fundedElectronic submission

Ort

FRK24, France

Dauer

12 MONTH

Kategorie

Microelectronic machinery and apparatus

Zuschlagskriterien

Price

Frist

Expired Jul 31, 2026

Vergabedetails

Veröffentlichungsdatum
30 Jun 2026
Sprachen
French, English

Referenzmetadaten

Rechtsgrundlage
32014L0024

Referenz-IDs

Ausschreibungs-ID
452081-2026

Dokumente (1)