European Tender Electron Beam Lithography System
Originaltitel der Bekanntmachung
Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system
Opportunity Score
Warum diese Bewertung?
Chance
75 / 100
Komplexität
70 / 100
Risikofaktoren
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
Tiefe Portfolioanalyse
Verwendet:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications
Überblick
Moderate opportunityWichtige Fakten
- EUR 3.5M estimated value
- Supplies contract
- 1 lot
- Supply of an Electron Beam Lithography system
- Installation and commissioning at the University of Twente
Vollständige Zusammenfassung anzeigen
Purchase of an Electron Beam Lithography system for the University of Twente's MESA+ Institute. Single lot, open procedure, EU funded. Estimated value €3.5M. Deadline 14 August 2026. Limited information on award criteria and eligibility requirements.
Risiken
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
Analyse kann unvollständig sein
Nur ein Teil der Vergabeunterlagen wurde analysiert. Weitere Anforderungen, Zertifikate oder Einreichungsdokumente können in den übrigen Unterlagen enthalten sein.
Wichtige Anforderungen
Technical
- High resolution and high speed pattern definition in electron-sensitive resists
- Compatibility with substrate sizes up to 200mm diameter
- Suitable for a wide range of applications (photonics, nano-electronics, etc.)
Anforderungen können unvollständig sein.
Auftraggeber
Ort
Enschede, NLD
Website
Auftraggeberprofil
Kennung
50130536
Tätigkeit
Education
Lose (1)
LOT-0000
European Tender Electron Beam Lithography System
Supply, installation, and support of a high-resolution, high-speed Electron Beam Lithography system compatible with substrates up to 200mm for academic and industrial research.
EUR 3.5M
Geschätzter Wert
Ort
Kategorie
Frist
Zuschlagsdetails
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Zusätzliche CPV-Codes
Hinweis zum Wert
Originale TED-Daten anzeigen
Originaler Los-Titel
European Tender Electron Beam Lithography system
Originale TED-Beschreibung
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Vergabedetails
- Veröffentlichungsdatum
- 14 Jun 2026
- Sprachen
- English
Referenzmetadaten
- Rechtsgrundlage
- 32014L0024
Referenz-IDs
- Ausschreibungs-ID
- 409508-2026
Dokumente (1)
Ähnliche Ausschreibungen
Opportunity Score
Warum diese Bewertung?
Chance
75 / 100
Komplexität
70 / 100
Risikofaktoren
Missing award criteria and eligibility requirements create uncertainty in bid preparation
System must meet stringent technical specifications (high resolution, speed, substrate compatibility)
Tiefe Portfolioanalyse
Verwendet:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications