Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system

Universiteit TwenteEnschede, NetherlandsEUR 3,500,000 / ~EUR 3,500,00056 days leftopen

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Opportunity Score

Confidence: 50%

Complexity: medium

56 days

Deadline

supplies

Contract

Deep Portfolio Analysis

Company fit score
Missing certificates
Eligibility blockers
Bid / No-Bid recommendation

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AI Analysis Summary

Moderate opportunity

The University of Twente (MESA+ Institute) is procuring an Electron Beam Lithography system via an open procedure. The system must provide high resolution and high speed patterning on substrates up to 200mm. The tender value is €3,500,000 EUR. Submission deadline is 2026-08-14T10:00:00 UTC. The tender is conducted in English and electronic submission is allowed. No eligibility or award criteria are provided in the notice, and procurement documents have not been analyzed.

Strengths

Documents available

Open procedure

Medium complexity

Analysis may be incomplete

Only part of the procurement documentation was analyzed. Additional eligibility requirements, certificates, or submission documents may exist in the remaining tender documentation.

Key Requirements

System must achieve high resolution and high speed
Compatibility with a wide range of applications and substrate types
Must support substrates up to 200mm in diameter

Buyer

Name

Universiteit Twente

Location

Enschede, NLD

[email protected]

Website

www.utwente.nl

Buyer profile

Open profile

Identifier

50130536

Lots (1)

#LOT-0000European Tender Electron Beam Lithography system

Supply of one Electron Beam Lithography system for the MESA+ Institute. System must be suitable for defining patterns in electron sensitive resists at high resolution and high speed, compatible with substrates up to 200mm diameter, and usable by academic researchers, students, and industrial engineers.

EUR 3,500,00038000000, 38341100NLD